PMMA for Electron Beam Lithography (EBL)

We use a sandwich of two PMMA layers during our e-beam lithography procedure.

Contents

1. Materials
2. 25 kDa PMMA solution
3. 495 kDa PMMA solution

1. Materials

Make sure we have:

• 25kDA PMMA from Polymer Source Inc, Part number: P8443C-MMA (dead link)
• 495K PMMA A6 solution (495K M.W. 6% in anisole; part #495PMMA A6) from MicroChem PDF495PMMA-data-sheet
• Anisole from Sigma-Aldrich (part number 123226-1L PDF)
• PMMA Developer (MIBK:IPA=1:3) from MicroChem PDF (part #M/I 1:3)

2. 25 kDa PMMA solution

1. Dissolve the 25kDA PMMA in anisole to 3% (w/w). Typically I use magnetic stirring overnight.
2. Filter the PMMA solution with syringe filter.

3. 495 kDa PMMA solution

1. Dilute the 495K PMMA A6 solution (6% anisole) to 1.5% in anisole.
2. Filter the PMMA solution with syringe filter.